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Hongbo Ding
- Assistant Researcher
- PhD, Analytical Chemistry, University
of Science & Technology,
China, 2000
- MS, Phys. Chemistry, Chinese Academy of Sciences, 1998
- BS, Chemistry Education, Anhui Teacher's College, 1994
Research Interests:
- Corrosion (both electrochemistry and metallurgical
aspects)
- Electrochemistry (modified electrodes such as conducting polymer modified electrodes,
electrochemistry and photo-electrochemistry of semiconductors
as related to corrosion problems such as corrosion of semiconductor
particles-reinforced metal matrix composites, etc.)
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Recent and Current
Projects:
Corrosion mechanism of metal matrix composites
Contact Information:
Hawaii Corrosion Laboratory
University of Hawaii
Department of Mechanical Engineering
2540 Dole Street, Holmes Hall Room 302
Honolulu, HI 96822
Phone: (808) 956-4373
Fax: (808) 956-2373
Email: hbding@wiliki.eng.hawaii.edu
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Selected Publications:
- Hongbo
Ding, L.H. Hihara, "Localized
Corrosion Currents and pH Profile over B4C, SiC and Al2O3 Reinforced 6092 Aluminum Composites I. In 0.5M Na2SO4 Solution, " Journal of the Electrochemical Society, Vol. 152, No. 4, 2005.
- H. Ding, S.-M. Park, "Electrochemistry
of Conductive Polymers XXVII. Effects of Polystyrene Sulfonate on Electrochemical Behavior of Polyaniline," Journal of the Electrochemical Society, 150 (1): E33-E38 January 2003.
- H. Ding, Z. Pan, L. Pigani, and R. Seeber, “Impedance characteristics of poly
(4,4 '- bis(butylsulfanyl)-2,2 '-bithiophene) film electrode
as a
function of different oxidation levels” Journal of New Materials
for Electrochemical Systems 4, 63 (2001).
- H. Ding, Z. Pan, L. Pigani, R. Seeber, and C. Zannardi, “P- and n-doping processes
in polythiophene with reduced bandgap. An electrochemical impedance
spectroscopy study” Electrochim. Acta 46(17), 2721 (2001).
- H. Ding, L. Pigani, R. Seeber, and C. Zannardi, “p- and n-doping of electrochemically
formed poly(4,4 '-bisbutylsulfanyl-2,2 '-bithiophene). A novel
material with reduced bandgap” Journal of New Materials for Electrochemical Systems 3, 339 (2000).
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